Accurion EP4
Imaging Ellipsometer
The EP4, our latest generation of imaging ellipsometers, combines ellipsometry and microscopy. This enables the characterization of thickness and refractive index with the sensitivity of ellipsometry on micro-structures as small as 1 µm. The microscopic part enables a simultaneous measurement of all structures inside the field of view of the optical system. Conventional ellipsometers have to focus on the measurement spot, while not achieving comparable lateral resolution, and measure spot by spot.
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Accurion EP4 Imaging Ellipsometer
The EP4, our latest generation of imaging ellipsometers, combines ellipsometry and microscopy. This enables the characterization of thickness and refractive index with the sensitivity of ellipsometry on micro-structures as small as 1 µm. The microscopic part enables a simultaneous measurement of all structures inside the field of view of the optical system. Conventional ellipsometers have to focus on the measurement spot, while not achieving comparable lateral resolution, and measure spot by spot.
The microscopic part of the EP4 enables an ellipsometric-enhanced contrast for microscopic images obtained. Minor changes in refractive index or thickness can be seen in the live view of the camera. This allows to identify regions of interest for the ellipsometric measurements to obtain values for thickness (0.1 nm - 10 µm) and refractive index. 3D maps of the lateral variation of thickness and/or refractive index can be recorded within a single measurement.
Combination with complementary methods, e.g. AFM, QCM-D, reflectometry, Raman, is available to allow the observation of the same area.
KEY FEATURES
- Modular setup: Easy upgrades between different configurations from BAM, single wave-, multiwave- to full spectroscopic ellipsometer
- Spectroscopic imaging ellipsometry from 190/250/360 nm to 1000/1700/2700 nm
- Highest lateral ellipsometric resolution of 1 µm, allowing to determine thickness and refractive index on microstructures as small as 1 µm
- Ellipsometric enhanced contrast images for a live visualization of the sample
- First identify, then measure: Intuitive selection of measurement region by drawing region in live view
- Parallel measurement of multiple regions within the selected field of view
- Patented knife-edge illumination for the non-destructive suppression of disturbing backside-reflections
- Enlarge your measurement possibilities by using additional accessories, e.g. cells, temperature control or liquid handling
- Quality Control: Also available as OEM version for QC in product lines
SOPHISTICATED MODELING SOFTWARE
The modular EP4 software allows direct control and parallel or offline analysis. The EP4 control operates the instrument. Regions for measurements can be selected in the live view. Multiple samples can be arranged and measured automatically. The DataStudio enables data processing of the recorded data. Histogram analysis and line profiles offer a great insight into the details for your samples. The EP4 Model allows the modeling of the samples. Its intuitive handling concept helps the user to create simple to complex sample structures of thin films. It yields information on thickness and refractive indices of the sample. Further physical parameters, e.g. Bandgap or Volume Fraction of a mixed material layer can be obtained as well.
TECHNOLOGY
Imaging Ellipsometry (IE)
Accurion’s Imaging Ellipsometers combine the benefits of ellipsometry and optical microscopy in a single device. The unification of the two technologies creates a unique metrology tool that redefines the limits of both ellipsometric measurements and polarization-contrast microscopy. The enhanced spatial resolution of imaging ellipsometers (about 1 µm) expands ellipsometry into new areas of microanalysis, microelectronics, and bio analytics.
Imaging Ellipsometry in a Nutshell
Imaging Ellipsometry is an all-optical, non-contact metrology technique that excels at the layer-thickness and material characterization of micro-structured thin-film samples and substrates.
The technique combines microscope imaging with the measurement principles of spectroscopic ellipsometry. It reaches a spatial resolution of about 1 µm, easily beating the limits of other optical metrology tools such as regular ellipsometers or reflectometers.
The measurement is based on the sample’s interaction with polarized light. By means of computational modeling, the measured polarization properties translate into maps of the physical sample properties like layer thickness, refractive index and absorption, roughness or anisotropy.
APPLICATIONS
I. 2D-Materials
Spectroscopic ellipsometric measurements on flakes of 2D-materials with sizes down to 1µm
Microscopic maps of thickness distribution and refractive indices from 190-1700nm
Ellipsometric contrast micrographs (ECM) enable increased contrast imaging over e.g. optical microscopy to visualize layer numbers and inhomogeneities
Non-destructive measurements on transparent substrates using knife edge illumination to prevent unwanted backside reflections
II. CURVED SURFACES
Ellipsometry is a very sensitive technique to measure thin films and antireflection (AR) coatings. However, it usually works for flat samples only. By using our patented technique in combination with the Imaging Ellipsometer ep4 on curved surfaces, we can overcome this issue and measure e.g. AR coatings on micro-lens-arrays.
Measure layer thickness and refractive index on curved surfaces
Investigate anti-reflection coatings on lenses, curved mirrors and micro-lens-arrays
Determine thickness distribution of multiple objects within a single measurement
III. TRANSPARENT SUBSTRATES
Thin films on transparent substrates are of increased interest in advanced technologies like flexible displays, but this often raises the question of how to suppress disturbing backside reflections in a non-destructive manner. Knife edge illumination is a very effective tool to cope with this issue without damaging the sample.
IV. SURFACE ENGINEERING
The main attempt of silanization is to form bonds across the interface between mineral/inorganic components and organic components present in paints, adhesives etc., or as the anchor for further steps of surface modifications.
This step proved to be difficult to measure with conventional methods. As for imaging ellipsometry, it provides the sensitivity to investigate e.g. the formation of bonds in a structured array for the use in micro-arrays without the need of an additional fluorescence marker, making it an exceptional device.
V. AIR-WATER INTERFACE
The air/water interface is of elementary interest in biophysics as well as in industrial applications. Brewster angle microscopy (BAM) is a powerful technique that allows for real-time visualization of Langmuir-Blodgett monolayers.
BAM applications visualize biological materials and systems, and enable the investigation of amphiphilic molecules, proteins, drugs, extracts, DNA, nanoparticles etc. at the air-water interface.
VI. ANISOTROPIC FILMS
Anisotropic micro crystals show high potential for the applications in e.g. microelectronic devices and flexible electronics. Most organic single crystals indicate a highly anisotropic optical behavior. Regarding anisotropic samples, the refractive index depends on the polarization of light and direction of propagation.
Imaging Mueller Matrix Ellipsometry (IMME) is an advanced technique required for the complete and accurate characterization of anisotropic and/or depolarizing samples. By using IMME with a microscope objective lens, the measurement of anisotropic refractive indices and the orientation of the optical axes becomes feasible even on micro-structured thin-film samples such as Black Phosphorous (BP) flakes.
VII. BIO-INTERFACES
Biological applications demand high sensitivity observation techniques. Additionally, the environment needs to be controllable in order to avoid influencing or damaging the behavior of observed materials.
Imaging Ellipsometry (IE) offers highest sensitivity for thickness or surface coverage of mono- as well as sub-monolayers with microscopic resolution. High resolution micromaps of the ellipsometric angles Δ and Ψ, and the unique ellipsometric contrast mode for thin films offers insight in real-time to thickness changes on microstructures.
Useful accessories as e.g. cells, QCM-D etc. enlarge the field of measurement and research for biological applications.
Typical applications include:
In-situ Imaging Ellipsometry
Integration of QCM-D
Microscopic i-SPREE
Supported Bilayers
Biophysics
Microscopic Mapping
Microarrays / Microfilms
Biomolecular Interaction
VIII. MEMS
Spectroscopic ellipsometry on MEMS structures down to 1µm
Precise film thickness measurement on comb structure with 0.1nm thickness resolution
Multiple results from a single measurement: Film thickness, refractive index, composition, contaminations
ECM mode (Ellipsometric Contrast enhanced Microscopy) for fast quality control
Measurements on curved surfaces
Typical applications include:
MEMS sensors
MEMS mirrors and spring coating
RF MEMS
Thin film encapsulation
Gas analyzers
Humidity sensors
IX. PHOTONICS
Spectroscopic ellipsometry on small optical fibers and waveguides with lateral resolution down to 1µm
Precise refractive index measurement on waveguides, vertical facets and fiber ends with relative refractive index difference < 0.001
Precise film thickness measurement with 0.1nm thickness resolution
Wavelength range 190nm - 1700nm (IR upgrade to 2700nm possible)
Multiple results from a single measurement: Film thickness, refractive index, composition, contaminations
ECM mode (Ellipsometric Contrast enhanced Microscopy) for fast quality control
Typical applications include:
Photonics and waveguides
Integrated photonics
Vertical facets
Optical fibers
X. DISPLAYS
Spectroscopic measurements on few micron small regions, using patented ROI (Region Of Interest) concept
Each ROI (Region Of Interest) corresponds to another layer stack
⇒ Multiple measurements in a single run
Coupling thicknesses between different models allows uncorrelating the results of multi layer films
UV wavelength range down to 190nm to characterize display materials
Multiple results from a single measurement: Thicknesses, optical dispersions, compositions
Pattented RCE6 mode allows tact times of < 20s
XI. BATTERY MATERIALS
To learn more about electrode materials for Battery applications, it is required to follow the charging/decharging of the system
A very promising approach is Operando Imaging Ellipsometry
Continuousmeasurements of Microscopic maps of Delta and Psi during charging and decharging of the sample
Extracting Delta and Psi from a large region of interest of the maps that represent the shape of the complete sample as well as from tiny regions of interest that represent only local properties of the film ⇒ Average and details from one measurement
Direct comparison of sample and substrate under exactly the same conditions
All analysis can be done in post process by having the complete maps recorded
Other processes like profiles, sub region analysis, histogram analysis, math functions etc. are available as well